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Document Details
Document Type
:
Article In Journal
Document Title
:
Effect of annealing on properties of decorative zirconium oxynitride thin films
Effect of annealing on properties of decorative zirconium oxynitride thin films
Subject
:
physics
Document Language
:
English
Abstract
:
Zirconium oxynitrides are excellent candidates for many technological applications, especially decorative applications. For the use of zirconium oxynitrides as decorative coatings, the thermal stability is of crucial importance. Therefore zirconium oxynitrides, containing both oxygen and nitrogen, were prepared by pulsed d.c. reactive magnetron sputtering at pN(2)/(PN2 + pO(2)) of 0.98. The asprepared films were annealed in air for 1 h. The full set of annealing was 100, 200, 300, 400, 450, 500 and 550 degrees C. The annealed zirconium oxynitride films exhibited nitrogen loss (oxidation). The nitrogen loss results in a great variance in compositional, electrical and optical properties. The energy dispersive analysis of X-ray and X-ray diffraction were used to examine the compositional and structural properties, respectively. A huge increase in the electrical resistivity was observed upon oxidation. The films annealed at higher temperatures (>= 450 degrees C) showed insulating behavior with low extinction coefficient (<1) and reasonable refractive index values. The optical band gap values of the films annealed at 500 degrees C and 550 degrees C are in good agreement with the previously reported values for ZrO2
ISSN
:
1286-0042
Journal Name
:
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
Volume
:
69
Issue Number
:
36
Publishing Year
:
1435 AH
2015 AD
Article Type
:
Article
Added Date
:
Monday, August 21, 2017
Researchers
Researcher Name (Arabic)
Researcher Name (English)
Researcher Type
Dr Grade
Email
S.H Mohamed
Mohamed, S.H
Investigator
Doctorate
N.M.A Hadia
Hadia, N.M.A
Researcher
Doctorate
S.M Ali,
Ali, S.M
Researcher
Doctorate
Files
File Name
Type
Description
42720.pdf
pdf
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